UoH, IIT Hyderabad Patent Nanotech Method
Analysis based on 6 articles · First reported Jun 30, 2026 · Last updated Jul 01, 2026
The patented technology is expected to accelerate research and commercial applications of advanced nanomaterials, particularly in electronics, photonics, and energy devices. This innovation could lead to more efficient and cost-effective production of next-generation electronic components, potentially benefiting companies in the semiconductor and electronics industries by providing a scalable manufacturing solution for 2D materials.
A collaborative team from the University of Hyderabad (UoH) and the IIT Hyderabad (IIT Hyderabad) has been granted an Indian patent for a novel method to fabricate atomically thin transition metal dichalcogenide (TMDC) nanosheets. The patented technique, titled 'Method for Fabricating One or More Layered TMDC Material Using Bessel Beam Femtosecond Laser Ablation', uses a high-precision femtosecond laser shaped into a Bessel beam to separate TMDC layers without damaging their chemical structure. This innovation, developed by Santosh Kumar, Challa Rajendra Kumar, Moram Sree Satya Bharati, and Soma Venugopal Rao, offers a faster, more cost-effective, and scalable approach compared to conventional methods. It is expected to significantly advance nanotechnology, semiconductor devices, and energy applications, reinforcing India's capabilities in cutting-edge materials science.
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