China develops immersion DUV lithography

Recent reports indicate that China has developed its own immersion deep-ultraviolet (DUV) lithography system, a significant step toward closing the technology gap maintained by US export controls. Korean experts caution that building the machine is only the first step; China may need years to prove reliability, throughput, and commercially viable yields. Initial yields are estimated at 10-20%, far below the 90% needed for profitable mass production, though state support could sustain growth. The advance poses little immediate threat to Korean chipmakers like Samsung Electronics and SK Hynix, which are advancing to next-generation memory technologies, but Beijing's tolerance for low profits could steadily narrow the technology gap.